Overlay performance with advanced ATHENA™ alignment strategies

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 5038 II, Issue , 2003, Pages 918-928

  Huijbregtse, Jeroen ^a   Van Haren, Richard ^a   Jeunink, André ^a   Hinnen, Paul ^a   Swinnen, Bart ^a   Navarro, Ramon ^a   Simons, Geert ^a   Van Bilsen, Frank ^a   Tolsma, Hoite ^a   Megens, Henry ^a  

^a ASML   (Netherlands)

Author keywords

Alignment; Applications; Mark design; Metrology; Overlay; Processing

Indexed keywords

CHEMICAL MECHANICAL POLISHING; OPTICAL DESIGN; OPTICAL VARIABLES MEASUREMENT; OPTIMIZATION; SENSORS; SPATIAL VARIABLES MEASUREMENT;

ALIGNMENT MARK; ALIGNMENT SENSORS; MARK DESIGN; OVERLAY PERFORMANCE;

LITHOGRAPHY;

EID: 0141723568     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.482814     Document Type: Conference Paper

References (8)

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