New color alignment for CMOS image sensor

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 6520, Issue PART 3, 2007, Pages

  Dagan, Miri Kish ^a   Edart, Remi ^b   Rechtman, Hadas ^a   Kanfi, Yehuda ^b   Warnaar, Patrick ^b   Moshe, Oshri ^a   Van Haren, Richard ^b  

^a TOWER SEMICONDUCTOR LTD   (Israel)

^b ASML   (Netherlands)

Author keywords

Alignment sensor; Color resist; Image sensor; Mark design; Overlay

Indexed keywords

ALIGNMENT; CMOS INTEGRATED CIRCUITS; IMAGE PROCESSING; LIGHT ABSORPTION; PHOTOLITHOGRAPHY;

ALIGNMENT SENSOR; COLOR FILTER PROCESSES; COLOR RESIST; MARK DESIGN;

IMAGE SENSORS;

EID: 35148855075     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.712200     Document Type: Conference Paper

References (8)

1. P. Hinnen et al, "Integration of a new alignment sensor for advanced technology nodes", SPIE Microlithography, 2007
2. S. Warrick et al, "Alignment robustness for 90 and 65nm node through Copper Alignment Mark Integration Optimization", Proc. SPIE Microlithography, vol 5754, 2005, pp. 854-864
3. Y. Cui et al, "Segmented Alignment Mark Optimization and Signal Strength Enhancement for Deep Trench Process", Proc. SPIE Microlithography, vol 5375, 2004, pp. 1265-1277
4. V. Korobov, et al, "Characterization methodology for micro-lens performance in CMOS Image Sensors", IEEE workshop, June 2001
5. D. Baillie, et al, "Zero-space micro-lenses for CMOS image sensors: optical modeling and lithographic process development", Proc. SPIE Microlithography, vol. 5377, 2004, pp. 953-959
6. R. Navarro, et al, "Extended Athena alignment performance and application for the 100nm technology node", Proc. SPIE Microlithography, vol. 4344, 2001, pp. 682-694
7. J. Huijbrechtse, et al, "Overlay Performance with Advanced ATHENA Alignment Recipes", Proc. SPIE Microlithography, vol. 5038, 2003, pp. 918-928
8. G. Rivera et al, "Overlay performance on tungsten CMP layers using the ATHENA alignment system", Proc. SPIE Microlithography, vol. 3998, 2000, pp. 428-440