Flexible alignment mark design applications using a next generation phase grating alignment system

Progress in Biomedical Optics and Imaging - Proceedings of SPIE

Volumn 5752, Issue I, 2005, Pages 363-374

  Hinnen, Paul ^a   Lee, Hyun Woo ^a   Keij, Stefan ^a   Takikawa, Hiroaki ^b   Asanuma, Keita ^c   Ishigo, Kazutaka ^c   Higashiki, Tatsuhiko ^c  

^a ASML   (Netherlands)

^b HITACHI HIGH TECHNOLOGIES CORPORATION   (Japan)

^c TOSHIBA CORPORATION   (Japan)

Author keywords

Alignment Sensor; Applications; Mark Design; Metrology; Overlay; Wafer Processing

Indexed keywords

DIFFRACTION GRATINGS; MASKS; OPTIMIZATION; SEMICONDUCTOR DEVICES; SENSORS;

ALIGNMENT SENSORS; MARK DESIGN; OVERLAY; WAFER PROCESSING;

ALIGNMENT;

EID: 24644464696     PISSN: 16057422     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.599494     Document Type: Conference Paper

References (12)

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