Carbon deposition on multi-layer mirrors by extreme ultra violet ray irradiation

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 6517, Issue PART 2, 2007, Pages

  Matsunari, S ^a   Aoki, T ^a   Murakami, K ^a   Gomei, Y ^b   Terashima, S ^a   Takase, H ^a   Tanabe, M ^a   Watanabe, Y ^a   Kakutani, Y ^c   Niibe, M ^c   Fukuda, Y ^a  

^a Extreme Ultra Violet Lithography System Development Association   (Japan)

^b CANON INC   (Japan)

^c UNIVERSITY OF HYOGO   (Japan)

Author keywords

Carbon deposition; Contamination; EUV lithography; EUV optics; Multi layer mirror

Indexed keywords

CARBON; CONTAMINATION; DEPOSITION; MIRRORS; ULTRAVIOLET RADIATION; X RAY PHOTOELECTRON SPECTROSCOPY;

CARBON DEPOSITION; EUV OPTICS; MULTI LAYER MIRRORS;

EXTREME ULTRAVIOLET LITHOGRAPHY;

EID: 35148850574     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.710816     Document Type: Conference Paper

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