Apparatus for contamination control development in EUVA

Progress in Biomedical Optics and Imaging - Proceedings of SPIE

Volumn 5751, Issue II, 2005, Pages 1137-1146

  Aoki, Takashi ^a   Kondo, Hiroyuki ^a   Matsunari, Shuichi ^a   Takase, Hiromitsu ^b   Gomei, Yoshio ^b   Terashima, Shigeru ^b  

^a EUVA   (Japan)

^b Utsunomiya Laboratory   (Japan)

Author keywords

Capping Layer; Carbon Deposition; Chemical Contamination; Extreme Ultraviolet Lithography; Oxidation

Indexed keywords

ELECTRON BEAMS; HYDROCARBONS; IMPURITIES; IRRADIATION; LITHOGRAPHY; OPTICAL PROPERTIES; OXIDATION; VACUUM; VAPORS;

CAPPING LAYER; CARBON DEPOSITION; CHEMICAL CONTAMINATION; EXTREME ULTRAVIOLET LITHOGRAPHY;

ULTRAVIOLET RADIATION;

EID: 24644462713     PISSN: 16057422     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.600488     Document Type: Conference Paper

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