Advances in process overlay-alignment solutions for future technology nodes

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 6518, Issue PART 2, 2007, Pages

  Megens, Henry ^a   Van Haren, Richard ^a   Musa, Sami ^a   Doytcheva, Maya ^a   Lalbahadoersing, Sanjay ^a   Van Kemenade, Marc ^a   Lee, Hyun Woo ^a   Hinnen, Paul ^a   Van Bilsen, Frank ^a  

^a ASML   (Netherlands)

Author keywords

[No Author keywords available]

Indexed keywords

CUSTOMER SATISFACTION; IMAGE SEGMENTATION; POLARIZATION; SEMICONDUCTOR MATERIALS; WAVELENGTH;

OPTICAL ALIGNMENT SYSTEMS; OVERLAY ALIGNMENT SOLUTIONS; POLARIZATION EFFECTS; SEMICONDUCTOR PRODUCT TECHNOLOGIES;

MASKS;

EID: 35148845088     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.712149     Document Type: Conference Paper

References (16)

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