Non-linear methods for overlay control

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 6518, Issue PART 3, 2007, Pages

  Kupers, Michiel ^a   Choi, Dongsub ^a   Habets, Boris ^a   Simons, Geert ^b   Wallerbos, Erik ^b  

^a QIMONDA DRESDEN GMBH AND CO OHG   (Germany)

^b ASML   (Netherlands)

Author keywords

Non linear; Overlay; Residuals

Indexed keywords

MATHEMATICAL MODELS; NONLINEAR CONTROL SYSTEMS; THROUGHPUT; WAFER BONDING;

NONLINEAR ALIGNMENT MODELS; OVERLAY CONTROL; WAFER CORRECTIONS;

DYNAMIC RANDOM ACCESS STORAGE;

EID: 35048897966     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.713092     Document Type: Conference Paper

References (6)

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2. Kevin Monahan and Brian Trafas, Design and Process Limited Yield at the 65nm Node and Beyond, Proc SPIE Vol. 5756, 230-239, (2004)
3. Nobuyuki, IRIE, Masato HAMATANI and Masahiro NEI, Progressive ArF Exposure Tool for the 65nm NodeLithography, Proc. SPIE Vol. 5754, 725-733, (2005)
4. Lithography of International Technology Roadmap for Semiconductors 2006 Update
5. H. J. L. Megens, R. J. F. van Haren, S. Musa, M. Doytcheva, S. Lalbahadoersing, M. van Kemenade, H. Lee, P. C. Hinnen, ASML Netherlands B.V. (Netherlands), Advances in process overlay: alignment solutions for future technology nodes, SPIE 2006 [6518-69]
6. David Laidler (IMEC), Identifying Sources of Overlay Error in FinFET Technology, Proc. SPIE Vol. 5752, 80-90, (2005)