Improvement of alignment and overlay accuracy on amorphous carbon layers

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 6152 I, Issue , 2006, Pages

  Hwang, Young Sun ^a   Kang, Eung Kil ^a   Lee, Ki Lyoung ^a   Ban, Keun Do ^a   Bok, Cheol Kyu ^a   Lim, Chang Moon ^a   Kim, Hyeong Soo ^a   Moon, Seung Chan ^a  

^a Hynix Semiconductor Inc   (South Korea)

Author keywords

Alignment; Amorphous Carbon; Overlay; SiON

Indexed keywords

ALIGNMENT SIGNAL; HARD MASK; OVERLAY CONTROL;

AMORPHOUS MATERIALS; ASPECT RATIO; DEPOSITION; ETCHING; IMAGE PROCESSING; LITHOGRAPHY; PHOTORESISTS;

CARBON;

EID: 33745599576     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.656416     Document Type: Conference Paper

References (6)

1. Jean-Damien Chapon., "Comparison between Organic Spin-On BARC and Carbon Containing CVD Stack for 65nm Gate Patterning." Proc. SPIE, 5753, P708, 2005
2. Jingmin Leng et al., "Optical Characterization of 193nm Amorphous Carbon ARC Film." Proc. SPIE, 5752, P1161, 2005.
3. Stefan Keij et al., "Advances in Phase-Grating Based Wafer Alignment System." Proc. SPIE, 5752, P. 948, 2005.
4. Cheolkyu BoK., "0.31k1 ArF Lithography for 70nm DRAM." Proc. SPIE, 5753, P230, 2005.
5. Roman chalykh et al., "Optimization of geometry of alignment mark using rigorous coupled wave analysis," Proc. SPIE, 5752, P. 471, 2005
6. Paul Hinnen et al., "Flexible Alignment Mark Design Applications using a Next Generation Phase Grating Alignment System," Proc. SPIE, 5752, P. 363, 2005.