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Volumn 45, Issue 11, 2006, Pages 2404-2408

Spin-on-glass coatings for the generation of superpolished substrates for use in the extreme-ultraviolet region

Author keywords

[No Author keywords available]

Indexed keywords

APPROXIMATION THEORY; DIAMONDS; SURFACE ROUGHNESS; ULTRAVIOLET DEVICES;

EID: 33744499487     PISSN: 1559128X     EISSN: 15394522     Source Type: Journal    
DOI: 10.1364/AO.45.002404     Document Type: Article
Times cited : (9)

References (12)
  • 5
    • 0034318652 scopus 로고    scopus 로고
    • Hydrogen silsesquioxane/novolak bilayer resist for high aspect ratio nanoscale electron-beam lithography
    • F. van Delft, J. Weterings, A. van Langen-Suurling, and H. Romijn, "Hydrogen silsesquioxane/novolak bilayer resist for high aspect ratio nanoscale electron-beam lithography," J. Vac. Sci. Technol. B 18, 3419-3423 (2000).
    • (2000) J. Vac. Sci. Technol. B , vol.18 , pp. 3419-3423
    • Van Delft, F.1    Weterings, J.2    Van Langen-Suurling, A.3    Romijn, H.4
  • 6
    • 0035893104 scopus 로고    scopus 로고
    • Fabrication of high-efficiency multilayer-coated binary blazed gratings in the EUV regime
    • P. Naulleau, E. Anderson, E. Gullikson, and J. Bokor, "Fabrication of high-efficiency multilayer-coated binary blazed gratings in the EUV regime," Opt. Commun. 200, 27-34 (2001).
    • (2001) Opt. Commun. , vol.200 , pp. 27-34
    • Naulleau, P.1    Anderson, E.2    Gullikson, E.3    Bokor, J.4
  • 7
    • 0347593748 scopus 로고    scopus 로고
    • Fabrication of high-efficiency multilayer-coated gratings for the EUV regime using e-beam patterned substrates
    • P. Naulleau, J. Liddle, E. Anderson, E. Gullikson, P. Mirkarimi, F. Salmassi, and E. Spiller, "Fabrication of high-efficiency multilayer-coated gratings for the EUV regime using e-beam patterned substrates," Opt. Commun. 229, 109-116 (2003).
    • (2003) Opt. Commun. , vol.229 , pp. 109-116
    • Naulleau, P.1    Liddle, J.2    Anderson, E.3    Gullikson, E.4    Mirkarimi, P.5    Salmassi, F.6    Spiller, E.7
  • 8
    • 1842510700 scopus 로고    scopus 로고
    • A design study for synchrotron-based high-numerical-aperture scanning illuminators
    • P. Naulleau, P. Denham, B. Hoef, and S. Rekawa, "A design study for synchrotron-based high-numerical-aperture scanning illuminators," Opt. Commun. 234, 53-62 (2004).
    • (2004) Opt. Commun. , vol.234 , pp. 53-62
    • Naulleau, P.1    Denham, P.2    Hoef, B.3    Rekawa, S.4
  • 9
    • 84893992087 scopus 로고    scopus 로고
    • note
    • The copper diamond-turned optic was manufactured by RPM Opto Electronics, Santa Rosa, Calif.
  • 10
    • 84894011411 scopus 로고    scopus 로고
    • note
    • The aluminum diamond-turned optic was manufactured by Nu-Tek Precision Optical Corporation, Aberdeen, Md.
  • 12
    • 84893992011 scopus 로고    scopus 로고
    • note
    • ZYGO Corporation, Middlefield, Conn.


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.