-
1
-
-
0032672027
-
-
L. C. McCarthy, P. Kozodoy, M. J. W. Rodwell, S. P. DenBaars, and U. K. Mishra, IEEE Electron Device Lett. 20, 277 (1999).
-
(1999)
IEEE Electron Device Lett.
, vol.20
, pp. 277
-
-
McCarthy, L.C.1
Kozodoy, P.2
Rodwell, M.J.W.3
Denbaars, S.P.4
Mishra, U.K.5
-
2
-
-
0038614798
-
-
H. Xing, M. Chavarkar, S. Keller, S. P. DenBaars, and U. K. Mishra, IEEE Electron Device Lett. 24, 141 (2003).
-
(2003)
IEEE Electron Device Lett.
, vol.24
, pp. 141
-
-
Xing, H.1
Chavarkar, M.2
Keller, S.3
Denbaars, S.P.4
Mishra, U.K.5
-
3
-
-
18344400601
-
-
D. J. H. Lambert, J. J. Huang, B. S. Shelton, M. M. Wong, U. Chowdhury, T. G. Zhu, H. K. Kwon, Z. Liliental-Weber, M. Benarama, M. Feng, and R. D. Dupuis, J. Cryst. Growth 221, 730 (2000).
-
(2000)
J. Cryst. Growth
, vol.221
, pp. 730
-
-
Lambert, D.J.H.1
Huang, J.J.2
Shelton, B.S.3
Wong, M.M.4
Chowdhury, U.5
Zhu, T.G.6
Kwon, H.K.7
Liliental-Weber, Z.8
Benarama, M.9
Feng, M.10
Dupuis, R.D.11
-
4
-
-
0032614607
-
-
J. Han, A. G. Baca, R. J. Shul, C. G. Willison, L. Zhang, F. Ren, A. P. Zhang, G. T. Dang, S. M. Donovan, X. A. Cao, H. Cho, K. B. Jung, C. R. Abernathy, S. J. Pearton, and R. G. Wilson, Appl. Phys. Lett. 74, 2702 (1999).
-
(1999)
Appl. Phys. Lett.
, vol.74
, pp. 2702
-
-
Han, J.1
Baca, A.G.2
Shul, R.J.3
Willison, C.G.4
Zhang, L.5
Ren, F.6
Zhang, A.P.7
Dang, G.T.8
Donovan, S.M.9
Cao, X.A.10
Cho, H.11
Jung, K.B.12
Abernathy, C.R.13
Pearton, S.J.14
Wilson, R.G.15
-
12
-
-
34848906470
-
-
Extended Abstract of the 2005 International Conference on Solid State Device and Materials
-
K. Kumakura and T. Makimoto, Extended Abstract of the 2005 International Conference on Solid State Device and Materials, 2005 (unpublished).
-
(2005)
-
-
Kumakura, K.1
Makimoto, T.2
-
13
-
-
4043059231
-
-
F. Ren, C. R. Abernathy, J. M. Van Hove, P. P. Chow, R. Hickman, J. J. Klaassen, R. F. Kopf, H. Cho, K. B. Jung, J. R. La Roche, R. G. Wilson, J. Han, R. J. Shul, A. G. Baca, and S. J. Pearton, MRS Internet J. Nitride Semicond. Res. 3, 41 (1998).
-
(1998)
MRS Internet J. Nitride Semicond. Res.
, vol.3
, pp. 41
-
-
Ren, F.1
Abernathy, C.R.2
Van Hove, J.M.3
Chow, P.P.4
Hickman, R.5
Klaassen, J.J.6
Kopf, R.F.7
Cho, H.8
Jung, K.B.9
La Roche, J.R.10
Wilson, R.G.11
Han, J.12
Shul, R.J.13
Baca, A.G.14
Pearton, S.J.15
-
14
-
-
33744547645
-
-
D. H. Keogh, P. M. Asbeck, T. Chung, J. Limb, D. Yoo, J.-H. Ryou, W. Lee, S.-C. Shen, and R. D. Dupuis, Electron. Lett. 42, 661 (2006).
-
(2006)
Electron. Lett.
, vol.42
, pp. 661
-
-
Keogh, D.H.1
Asbeck, P.M.2
Chung, T.3
Limb, J.4
Yoo, D.5
Ryou, J.-H.6
Lee, W.7
Shen, S.-C.8
Dupuis, R.D.9
-
16
-
-
0027627261
-
-
W. Liu, S. K. Fan, T. Henderson, and D. Davito, IEEE Trans. Electron Devices 40, 1351 (1993).
-
(1993)
IEEE Trans. Electron Devices
, vol.40
, pp. 1351
-
-
Liu, W.1
Fan, S.K.2
Henderson, T.3
Davito, D.4
-
17
-
-
0036539756
-
-
T. Makimoto, K. Kumakura, T. Nishida, and N. Kobayashi, J. Electron. Mater. 31, 313 (2002).
-
(2002)
J. Electron. Mater.
, vol.31
, pp. 313
-
-
Makimoto, T.1
Kumakura, K.2
Nishida, T.3
Kobayashi, N.4
-
18
-
-
18644368474
-
-
K. Kumakura, T. Makimoto, N. Kobayashi, T. Hashizume, T. Fukui, and H. Hasegawa, Appl. Phys. Lett. 86, 052105 (2005).
-
(2005)
Appl. Phys. Lett.
, vol.86
, pp. 052105
-
-
Kumakura, K.1
Makimoto, T.2
Kobayashi, N.3
Hashizume, T.4
Fukui, T.5
Hasegawa, H.6
-
19
-
-
33846421012
-
-
K. Kumakura, T. Makimoto, N. Kobayashi, T. Hashizume, T. Fukui, and H. Hasegawa, J. Cryst. Growth 298, 787 (2007).
-
(2007)
J. Cryst. Growth
, vol.298
, pp. 787
-
-
Kumakura, K.1
Makimoto, T.2
Kobayashi, N.3
Hashizume, T.4
Fukui, T.5
Hasegawa, H.6
|