Strain- and pressure-dependent RF response of microelectromechanical resonators for sensing applications

Journal of Micromechanics and Microengineering

Volumn 17, Issue 10, 2007, Pages 2016-2023

  Brueckner, K ^a   Cimalla, V ^a   Niebelschutz F ^a   Stephan, R ^a   Tonisch, K ^a   Ambacher, O ^a   Hein, M A ^a  

^a ILMENAU UNIVERSITY OF TECHNOLOGY   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

INFORMATION TECHNOLOGY; LORENTZ FORCE; MAGNETIC FIELDS; MEMS; PRESSURE EFFECTS; STRAIN RATE; TIME DOMAIN ANALYSIS;

MICROELECTROMECHANICAL RESONATORS; PERMANENT MAGNETIC FIELDS; RESIDUAL LAYER STRAIN; STRAINED BEAMS;

RESONATORS;

EID: 34748927164     PISSN: 09601317     EISSN: 13616439     Source Type: Journal    
DOI: 10.1088/0960-1317/17/10/013     Document Type: Article

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