Processing of novel SiC and group III-nitride based micro- And nanomechanical devices

Physica Status Solidi (A) Applications and Materials Science

Volumn 202, Issue 4, 2005, Pages 671-676

  Foerster, Ch ^a   Cimalla, V ^a   Brueckner, K ^a   Lebedev, V ^a   Stephan, R ^a   Hein, M ^a   Ambacher, O ^a  

^a ILMENAU UNIVERSITY OF TECHNOLOGY   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

EXCITAION SIGNALS; ISOTROPIC ETCHING; NANOMECHANICAL DEVICES; RESONATOR BEAMS;

ALUMINUM NITRIDE; DRY ETCHING; ELECTRON CYCLOTRON RESONANCE; EPITAXIAL GROWTH; NATURAL FREQUENCIES; PIEZOELECTRIC DEVICES; RESONATORS; SILICON CARBIDE; SUBSTRATES;

NANOSTRUCTURED MATERIALS;

EID: 25444527456     PISSN: 18626300     EISSN: 18626319     Source Type: Journal    
DOI: 10.1002/pssa.200460471     Document Type: Conference Paper

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