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Volumn 91, Issue 10, 2007, Pages

Low-resistance Ohmic contact on undoped AlGaNGaN heterostructure with surface treatment using C Cl2 F2 reactive ion etching

Author keywords

[No Author keywords available]

Indexed keywords

ANNEALING; CONTACT RESISTANCE; OHMIC CONTACTS; REACTIVE ION ETCHING; SEMICONDUCTING ALUMINUM COMPOUNDS; SURFACE TREATMENT;

EID: 34548485521     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.2779248     Document Type: Article
Times cited : (7)

References (19)


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.