메뉴 건너뛰기




Volumn 17, Issue 8, 2007, Pages 1593-1597

Smoothing dry-etched microstructure sidewalls using focused ion beam milling for optical applications

Author keywords

[No Author keywords available]

Indexed keywords

COMMINUTION; ION BEAM LITHOGRAPHY; OPTICAL SYSTEMS; SURFACE ROUGHNESS; SURFACE TREATMENT;

EID: 34547681668     PISSN: 09601317     EISSN: 13616439     Source Type: Journal    
DOI: 10.1088/0960-1317/17/8/023     Document Type: Article
Times cited : (36)

References (19)
  • 1
    • 0029488141 scopus 로고
    • Micro-opto-mechanical devices fabricated by anisotropic etching of (110) silicon
    • Uenishi Y, Masahiro T and Mehregany M 1995 Micro-opto-mechanical devices fabricated by anisotropic etching of (110) silicon J. Micromech. Microeng. 5 305-12
    • (1995) J. Micromech. Microeng. , vol.5 , Issue.4 , pp. 305-312
    • Uenishi, Y.1    Masahiro, T.2    Mehregany, M.3
  • 3
    • 0028407612 scopus 로고
    • Micromachined optical planes and reflectors in silicon
    • Rosengren L, Smith L and Backlund Y 1994 Micromachined optical planes and reflectors in silicon Sensors Actuators A 41-42 330-3
    • (1994) Sensors Actuators , vol.41 , Issue.1-3 , pp. 330-333
    • Rosengren, L.1    Smith, L.2    Backlund, Y.3
  • 4
    • 0025638187 scopus 로고
    • Silicon micromachined (2×2) optocoupler
    • Smith L, Tenerz L and Hok B 1990 Silicon micromachined (2×2) optocoupler Proc. SPIE 1281 91-5
    • (1990) Proc. SPIE , vol.1281 , pp. 91-95
    • Smith, L.1    Tenerz, L.2    Hok, B.3
  • 7
    • 33646194224 scopus 로고    scopus 로고
    • Fabrication of vertical optical plane using DRIE and KOH crystalline etching of (1 1 0) silicon wafer
    • Yun S-S, You S-K and Lee J-H 2006 Fabrication of vertical optical plane using DRIE and KOH crystalline etching of (1 1 0) silicon wafer Sensors Actuators A 128 387-94
    • (2006) Sensors Actuators , vol.128 , Issue.2 , pp. 387-394
    • Yun, S.-S.1    You, S.-K.2    Lee, J.-H.3
  • 8
    • 34247490320 scopus 로고    scopus 로고
    • Single-crystal-silicon continuous membrane deformable mirror array for adaptive optics in space-based telescopes
    • Jung I W, Peter Y-A, Carr E, Wang J-S and Solgaard O 2007 Single-crystal-silicon continuous membrane deformable mirror array for adaptive optics in space-based telescopes IEEE J. Sel. Top. Quantum Electron. 13 162-7
    • (2007) IEEE J. Sel. Top. Quantum Electron. , vol.13 , Issue.2 , pp. 162-167
    • Jung, I.W.1    Peter, Y.-A.2    Carr, E.3    Wang, J.-S.4    Solgaard, O.5
  • 9
    • 0005940052 scopus 로고    scopus 로고
    • Controlling sidewall smoothness for micromachined Si mirrors and lenses
    • Juan W H and Pang S W 1996 Controlling sidewall smoothness for micromachined Si mirrors and lenses J. Vac. Sci. Technol. B 14 4080-4
    • (1996) J. Vac. Sci. Technol. , vol.14 , Issue.6 , pp. 4080-4084
    • Juan, W.H.1    Pang, S.W.2
  • 11
    • 4043169217 scopus 로고    scopus 로고
    • High aspect ratio micromirrors with large static rotation and piston actuation
    • Milanovic V, Kwon S and Lee L P 2004 High aspect ratio micromirrors with large static rotation and piston actuation IEEE Photon. Technol. Lett. 16 1891-3
    • (2004) IEEE Photon. Technol. Lett. , vol.16 , Issue.8 , pp. 1891-1893
    • Milanovic, V.1    Kwon, S.2    Lee, L.P.3
  • 13
    • 33846082316 scopus 로고    scopus 로고
    • A study on focused ion beam milling of glassy carbon molds for the thermal imprinting of quartz and borosilicate glasses
    • Youn S, Takahashi M, Goto H and Maeda R 2006 A study on focused ion beam milling of glassy carbon molds for the thermal imprinting of quartz and borosilicate glasses J. Micromech. Microeng. 16 2576-84
    • (2006) J. Micromech. Microeng. , vol.16 , Issue.12 , pp. 2576-2584
    • Youn, S.1    Takahashi, M.2    Goto, H.3    Maeda, R.4
  • 14
    • 0029226544 scopus 로고
    • Focused ion beam deposition of new materials: Dielectric films for device modification and mask repair, and Ta films for x-ray mask repair
    • Stewart D K, Doyle A F and Casey Jr J D 1995 Focused ion beam deposition of new materials: dielectric films for device modification and mask repair, and Ta films for x-ray mask repair Proc. SPIE 2437 276-83
    • (1995) Proc. SPIE , vol.2437 , pp. 276-283
    • Stewart, D.K.1    Doyle, A.F.2    Casey, J.D.3
  • 16
    • 0032638771 scopus 로고    scopus 로고
    • A microaccelerometer structure fabricated in silicon-on-insulator using a focused ion beam process
    • Daniel J H and Moore D F 1999 A microaccelerometer structure fabricated in silicon-on-insulator using a focused ion beam process Sensors Actuators A 73 201-9
    • (1999) Sensors Actuators , vol.73 , Issue.3 , pp. 201-209
    • Daniel, J.H.1    Moore, D.F.2
  • 17
    • 0031073649 scopus 로고    scopus 로고
    • Silicon micro/nanomechanical device fabrication based on focused ion beam surface modification and KOH etching
    • Brugger J, Beljakovic G, Despont M, de Rooij N F and Vettiger P 1997 Silicon micro/nanomechanical device fabrication based on focused ion beam surface modification and KOH etching Microelectron. Eng. 35 401-4
    • (1997) Microelectron. Eng. , vol.35 , Issue.1-4 , pp. 401-404
    • Brugger, J.1    Beljakovic, G.2    Despont, M.3    De Rooij, N.F.4    Vettiger, P.5
  • 18
    • 15544378397 scopus 로고    scopus 로고
    • Etching submicrometer trenches by using the Bosch process and its application to the fabrication of antireflection structures
    • Chang C, Wang Y-F, Kanamori Y, Shih J-J, Kawai Y, Lee C-K, Wu K-C and Esashi M 2005 Etching submicrometer trenches by using the Bosch process and its application to the fabrication of antireflection structures J. Micromech. Microeng. 15 580-5
    • (2005) J. Micromech. Microeng. , vol.15 , Issue.3 , pp. 580-585
    • Chang, C.1    Wang, Y.-F.2    Kanamori, Y.3    Shih, J.-J.4    Kawai, Y.5    Lee, C.-K.6    Wu, K.-C.7    Esashi, M.8
  • 19
    • 2342636455 scopus 로고    scopus 로고
    • Recent developments in micromilling using focused ion beam technology
    • Tseng A A 2004 Recent developments in micromilling using focused ion beam technology J. Micromech. Microeng. 14 R15-34
    • (2004) J. Micromech. Microeng. , vol.14 , Issue.4
    • Tseng, A.A.1


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.