Vertical mirrors fabricated by deep reactive ion etching for fiber-optic switching applications

Journal of Microelectromechanical Systems

Volumn 6, Issue 3, 1997, Pages 277-284

  Marxer, Cornel ^b,d,e   Thio, Christian ^b,d   Grétillat, Marc Alexia ^b,e   De Rooij, Nicolaas F ^a,b   Bättig, Rainer ^c   Anthamatten, Oliver ^c   Valk, Bernd ^c   Vogel, Paul ^c  

^a IEEE

^b UNIVERSITY OF NEUCHÂTEL   (Switzerland)

^c Ascom Tech   (Switzerland)

^d EPFL   (Switzerland)

^e UNIVERSITY OF NEUCHÂTEL   (Switzerland)

Author keywords

Deep reactive ion etching; Electrostatic actuator; Fiber switch; Micromirror; Optical switch

Indexed keywords

ACTUATORS; ALUMINUM; ELECTROSTATICS; FABRICATION; FIBER OPTICS; OPTICAL SWITCHES; OXIDES; REACTIVE ION ETCHING; SURFACE ROUGHNESS;

DEEP REACTIVE ION ETCHING; ELECTROSTATIC ACTUATORS; OPTICAL FIBER SWITCH;

MIRRORS;

EID: 0031236013     PISSN: 10577157     EISSN: None     Source Type: Journal    
DOI: 10.1109/84.623118     Document Type: Article

References (27)

1. O. Solgaard, M. Daneman, N. C. Tien, A. Friedberger, R. S. Muller, and K. Y. Lau, "Optoelectronic packaging using silicon surface-micromachined alignment mirrors," IEEE Photon. Technol. Lett., vol. 7, no. 1, pp. 41-43, 1995.
2. Y. Uenishi, T. Masahiro, and M. Mehregany, "Micro-opto-mechanical devices fabricated by anisotropic etching of (110) silicon," J. Micromech. Microeng., vol. 5, pp. 305-312, 1995.
3. L. Rosengren, L. Smith, and Y. Bäcklund, "Micromachined optical planes and reflectors in silicon," Sens. Actuators A, vol. 41-42, pp. 330-333, 1994.
4. L. Smith, L. Tenerz, and B. Hök, "Silicon micromachined (2 × 2) optocoupler,× Spie, vol. 1281, Optical Interconnections and Networks, pp. 91-95, 1990.
5. S. Lardelli, G. Stauffert, and J. Jütz, "Attenuation of a 850 nm laser beam by thin silicon laminas," J. Micromech. Microeng., vol. 3, no. 4, pp. 229-231, 1993.
6. K. Akimoto, Y. Uenishi, K. Honma, and S. Nagaoka, "Evaluation of comb-drive nickel micromirror for fiber optical communication," in IEEE Int. Workshop on Micro Electro Mechanical Syst., Nagoya, Japan, Jan. 26-30, 1997, pp. 67-71.
7. Y. Uenishi, K. Honma, and S. Nagaoka, "Tunable laser diode using a nickel micromachined tunable mirror," Electron. Lett., vol. 32, no. 13, pp. 1207-1208, 1996.
8. J. Mohr, M. Kohl, and W. Menz, "Micro optical switching by electrostatic linear actuators with large displacements," in Proc. 7th Int. Conf. on Solid-State Sensors and Actuators (Transducers'93), Yokahama, Japan, 1993, pp. 120-123.
9. A. Müller, J. Göttert, and J. Mohr, "LIGA microstructures on top of micromachined silicon wafers used to fabricate a micro-optical switch," J. Micromech. Microeng., vol. 3, pp. 158-160, 1993.
10. K. S. J. Pister, M. W. Judy, S. R. Burgett, and R. S. Fearing, "Microfabricated hinges," Sens. Actuators A, vol. 33, pp. 249-256, 1992.
11. C. R. King, L. Y. Lin, and M. C. Wu, "Out-of-plane refractife microlens fabricated by surface micromachining," IEEE Photon. Technol. Lett., vol. 8, no. 10, pp. 1349-1351, 1996.
12. M. C. Wu, L. Y. Lin, S. S. Lee, and K. S. Pister, "Micromechanical free-space integrated micro-optics," Sens. Actuators A, vol. 50, pp. 127-134, 1995.
13. L. Y. Lin, J. L. Shen, S. S. Lee, G. D. Su, and M. C. Wu, "Microactuated micro-XYZ stages for free-space micro-optical bench," in IEEE Int. Workshop on Micro Electro Mechanical Syst., Nagoya, Japan, Jan. 26-30, 1997, pp. 43-48.
14. M. H. Kiang, O. Solgaard, R. S. Muller, and K. Y. Lau, "Micromachined polysilicon microscanners for barcode readers," IEEE Photon. Technol. Lett., vol. 8, no. 12, 1996.
15. E. H. Klaassen, K. Petersen, J. M. Noworolski, J. Logan, N. I. Malu, J. Brown, C. Storment, W. McCulley, and G. T. A. Kovacs, "Silicon fusion bonding and deep reactive ion etching: A new technology for microstructures," Sens. Actuators A, vol. 52, pp. 132-139, 1996.
16. L. Ward, The Optical Constants of Bulk Materials and Films. IOP, 1994. ch. 7.
17. H. A. Macleod, Thin Film Optical Filters Adam Hilger Ltd., 1980, ch. 2.
18. M. Bass, Ed., Handbook of Optics, vol. II. New York: McGraw-Hill, 1995. ch. 35.
19. J. C. Stover, Optical Scattering Measurement and Analysis. New York: McGraw-Hill, 1990, chs. 2-3.
20. T. V. Vorburger, E. Marx, and T. R. Lettieri, "Regimes of surface roughness measurable with light scattering," Appl. Opt., vol. 32, no. 19, pp. 3401-3408, 1993.
21. P. Beckmann and A. Spizzichino, The Scattering of Electromagnetic Waves from Rough Surfaces. Norwood, MA: Artech House, 1987, chs. 3-5.
22. C. M. Miller, Optical Fiber Splices and Connectors. New York: Marcel Dekker, 1986, ch. 4.
23. J. K. Bhardwaj and H. Ashraf, "Advanced silicon etching using high density plasma," in Spie Vol. 2639, Proc. Micromachining and Microfabrication Process Technology, Austin, TX, Oct. 1995, pp. 224-233.
24. H. Jansen, M. de Boer, and M. Elwenspoek, "The black silicon method VI, high aspect ratio trench etching for MEMS applications," in Proc. IEEE Workshop on Micro Electro Mechanical Syst. (MEMS'96), San Diego, CA, Jan. 1996, pp. 250-257.
25. Patent pending.
26. S. S. Lee, L. Y. Lin, and M. C. Wu, "Realization of FDDI optical bypass switches using surface micromachining technology," Spie Vol. 2641, pp. 41-48, 1995.
27. J. Mohr, J. Götten, A. Müller, and C. Müller, "Micro-optical components and systems fabricated by the LIGA technique," in Proc. Micromechanics Europe'96 (Barcelona, Spain), pp. 30-33.