Electrical characterization of platinum deposited by focused ion beam

IEEE Transactions on Semiconductor Manufacturing

Volumn 16, Issue 2, 2003, Pages 199-206

  Smith, Stewart ^a   Walton, Anthony J ^a   Bond, Sue ^a   Ross, Alan W S ^a   Stevenson, J Tom M ^a   Gundlach, Alan M ^a  

^a UNIVERSITY OF EDINBURGH   (United Kingdom)

Author keywords

Deposition; FIB; Focused ion beam; Metrology; Organometallic; Sheet resistance; Simulation; Test structures; Van der Pauw method

Indexed keywords

DEPOSITION; IMAGE ANALYSIS; MASKS; ORGANOMETALLICS; PLATINUM; SILICON;

FOCUSED ION BEAMS (FIB);

ION BEAMS;

EID: 0037954358     PISSN: 08946507     EISSN: None     Source Type: Journal    
DOI: 10.1109/TSM.2003.811580     Document Type: Article

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