Microaccelerometer structure fabricated in silicon-on-insulator using a focused ion beam process

Sensors and Actuators, A: Physical

Volumn 73, Issue 3, 1999, Pages 201-209

  Daniel, J H ^a   Moore, D F ^a  

^a UNIVERSITY OF CAMBRIDGE   (United Kingdom)

Author keywords

[No Author keywords available]

Indexed keywords

ION BEAMS; MICROMACHINING; MICROSENSORS; SILICON ON INSULATOR TECHNOLOGY;

FOCUSED ION BEAM (FIB) PROCESSING; MICROACCELEROMETERS;

ACCELEROMETERS;

EID: 0032638771     PISSN: 09244247     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0924-4247(98)00237-4     Document Type: Article

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