Preparation of nanocrystalline cubic silicon carbide thin films by hot-wire CVD at various filament-to-substrate distances

Surface and Coatings Technology

Volumn 201, Issue 22-23 SPEC. ISS., 2007, Pages 8986-8990

  Tabata, Akimori ^a   Komura, Yusuke ^a  

^a NAGOYA UNIVERSITY   (Japan)

Author keywords

Hot wire CVD; Low temperature deposition; Nanocrystalline; Silicon carbide

Indexed keywords

CHEMICAL VAPOR DEPOSITION; CRYSTAL GROWTH; CRYSTAL MICROSTRUCTURE; NANOCRYSTALLINE MATERIALS; SUBSTRATES; THIN FILMS;

CRYSTALLINITY; CUBIC SILICON CARBIDE; HOT-WIRE CHEMICAL VAPOR DEPOSITION;

SILICON CARBIDE;

CHEMICAL VAPOR DEPOSITION; CRYSTAL GROWTH; CRYSTAL MICROSTRUCTURE; NANOCRYSTALLINE MATERIALS; SILICON CARBIDE; SUBSTRATES; THIN FILMS;

EID: 34547676748     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.surfcoat.2007.04.100     Document Type: Article

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