Nanocrystal line β-SiC films grown on carbonized Si substrate by Cat-CVD

Diamond and Related Materials

Volumn 12, Issue 9, 2003, Pages 1505-1509

  Zhao, Q ^a   Wang, B ^a   Li, J C ^a   Wang, M ^a   Song, X M ^a   Wang, H ^a   Yan, H ^a  

^a BEIJING UNIVERSITY OF TECHNOLOGY   (China)

Author keywords

Chemical vapor deposition; Nucleation; Silicon carbide

Indexed keywords

CARBONIZATION; CATALYSIS; CHEMICAL VAPOR DEPOSITION; NANOSTRUCTURED MATERIALS; NUCLEATION; SILICON CARBIDE;

NUCLEATION DENSITY;

THIN FILMS;

CHEMICAL VAPOR DEPOSITION;

EID: 0142216089     PISSN: 09259635     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0925-9635(03)00180-8     Document Type: Article

References (15)

1. Sun Y. Kirimoto K. Miyasato T. Jpn. J. Appl. Phys. 39 2000 6202
2. Matsumura H. Jpn. J. Appl. Phys. 25 1986 L949
3. Mahan A.H. Carapella J. Nelson B.P. Crandall R.S. J. Appl. Phys. 69 1991 6728
4. Matsumura H. Appl. Phys. Lett. 51 1987 804
5. Deshpande S.V. Dupie J.L. Gulari E. Appl. Phys. Lett. 61 1992 1420
6. Kerdihes S. Rizk R. Gourblleau F. Perez-Rodriguez A. Garrido B. Gonzalez-Varona O.et al. Mater. Sci. Eng. B 69-70 2000 530
7. Lee S.W. Choi Y.S. Moon J.Y. Ahn S.S. Kim H.Y. Shin D.H. J. Korean Phys. Soc. 34 1999 562
8. Sun Y. Miyasato T. Jpn. J. Appl. Phys. 37 1998 5485-5489
9. Sun Y. Kirimoto K. Miyasato T. Jpn. J. Appl. Phys. 39 2000 6202-6207
10. Boo J.H. Yu K.S. Lee M. Kim Y. Appl. Phys. Lett. 66 1995 3487
11. Chayahara A. Kiuchi M. Kinomura A. Mokano Y. Horino Y. Fuji K. Jpn. J. Appl. Phys. 32 1993 1287
12. Mogab C.J. Leamg H.J. J. Appl. Phys. 45 1974 1075
13. Sun Y. Kirimoto K. Miyasato T. Jpn. J. Appl. Phys. 39 2000 6202
14. J.C. Lee, K.W. Kang, S.K. Km, K.H. Yoon, J. Song, I.J. Park, Extended Abstract of the 1st International Conference on Cat-CVD process, November 14-17, Kanazawa, Japan, 2000, p. 155
15. Matsumura H. Jpn. J. Appl. Phys. 28 1989 2157