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Volumn 395, Issue 1-2, 2001, Pages 298-304
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Current status of the thermo-catalytic (hot-wire) CVD of thin silicon films for photovoltaic applications
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Author keywords
Amorphous materials; Chemical vapor deposition (CVD); Deposition process; Heterostructures; Solar cells
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Indexed keywords
AMORPHOUS SILICON;
CATALYSIS;
CHEMICAL VAPOR DEPOSITION;
CRYSTALLINE MATERIALS;
HETEROJUNCTIONS;
INTERFACES (MATERIALS);
PHOTOVOLTAIC CELLS;
SILICON WAFERS;
SOLAR CELLS;
TUNNEL JUNCTIONS;
SILICON FILMS;
THERMOCATALYSIS;
THIN FILMS;
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EID: 0035800979
PISSN: 00406090
EISSN: None
Source Type: Journal
DOI: 10.1016/S0040-6090(01)01277-9 Document Type: Conference Paper |
Times cited : (32)
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References (28)
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