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Volumn 395, Issue 1-2, 2001, Pages 298-304

Current status of the thermo-catalytic (hot-wire) CVD of thin silicon films for photovoltaic applications

Author keywords

Amorphous materials; Chemical vapor deposition (CVD); Deposition process; Heterostructures; Solar cells

Indexed keywords

AMORPHOUS SILICON; CATALYSIS; CHEMICAL VAPOR DEPOSITION; CRYSTALLINE MATERIALS; HETEROJUNCTIONS; INTERFACES (MATERIALS); PHOTOVOLTAIC CELLS; SILICON WAFERS; SOLAR CELLS; TUNNEL JUNCTIONS;

EID: 0035800979     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0040-6090(01)01277-9     Document Type: Conference Paper
Times cited : (32)

References (28)


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.