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Volumn 10, Issue 9, 2007, Pages 264-266

Influence of F+ Co-implants on EOR defect formation in B + -implanted, ultrashallow junctions

Author keywords

[No Author keywords available]

Indexed keywords

DEFECTS; DIFFUSION; GERMANIUM COMPOUNDS; SILICON COMPOUNDS;

EID: 34547178226     PISSN: 10990062     EISSN: None     Source Type: Journal    
DOI: 10.1149/1.2751837     Document Type: Article
Times cited : (3)

References (18)


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.