Synthesis of germanium nanocrystals in hafnium aluminum oxide matrix

Journal of Applied Physics

Volumn 101, Issue 11, 2007, Pages

  Zheng, F ^a   Chew, H G ^b   Choi, W K ^a,b   Zhang, J X ^a   Seng, H L ^c  

^a NATIONAL UNIVERSITY OF SINGAPORE   (Singapore)

^b SINGAPORE MIT ALLIANCE   (Singapore)

^c INSTITUTE OF MATERIALS RESEARCH AND ENGINEERING   (Singapore)

Author keywords

[No Author keywords available]

Indexed keywords

HAFNIUM COMPOUNDS; MASS SPECTROMETRY; NANOCRYSTALS; RAMAN SPECTROSCOPY; SYNTHESIS (CHEMICAL); TRANSMISSION ELECTRON MICROSCOPY;

ANNEALING TEMPERATURE; HAFNIUM ALUMINUM OXIDE (HFALO) MATRIX;

GERMANIUM;

EID: 34250644026     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.2738385     Document Type: Article

References (24)

1. J. De Blauwe, IEEE Trans. NanoTechnol. 1, 72 (2002). 1536-125X
2. S. Tiwari, F. Rana, K. Chan, H. Hanafi, W. Chan, and D. Buchanan, IEDM Tech. Digest (1995), p. 424.
3. Y. C. King, T. J. King, and C. Hu, IEEE Trans. Electron Devices 0018-9383 10.1109/16.915694 48, 696 (2001).
4. J. K. Kim, H. J. Cheong, Y. Kim, J. Y. Yi, and H. J. Bark, Appl. Phys. Lett. 0003-6951 10.1063/1.1567039 82, 2527 (2003).
5. M. Kanoun, A. Souifi, T. Baron, and F. Mazen, Appl. Phys. Lett. 0003-6951 10.1063/1.1751227 84, 5079 (2004).
6. X. B. Lu, P. F. Lee, and J. Y. Dai, Appl. Phys. Lett. 0003-6951 10.1063/1.1926414 86, 203111 (2005).
7. N. Terasawa, K. Akimoto, Y. Mizuno, A. Ichimiya, K. Sumitani, T. Takahashi, X. W. Zhang, H. Sugiyama, H. Kawata, T. Nabatame, and A. Toriumi, Appl. Surf. Sci. 244, 16 (2005). 0169-4332
8. J. H. Shen, Y. Q. Wang, W. J. Yoo, Y. C. Yeo, G. Samudra, D. S. H. Chan, A. Y. Du, and D. L. Kwong, IEEE Trans. Electron Devices 51, 1846 (2004).
9. P. F. Lee, X. B. Lu, J. Y. Dai, H. L. W. Chan, E. Jelenkovic, and K. Y. Tong, Nanotechnology 0957-4484 10.1088/0957-4484/17/5/006 17, 1202 (2006).
10. W. K. Choi, H. G. Chew, F. Zheng, W. K. Chim, Y. L. Foo, and E. A. Fitzgerald, Appl. Phys. Lett. 0003-6951 10.1063/1.2354012 89, 113126 (2006).
11. Q. C. Zhang, N. Wu, L. K. Bera, and C. X. Zhu, Mater. Res. Soc. Symp. Proc. 829, 449 (2005).
12. W. L. Liu, P. F. Lee, J. Y. Dai, J. Wang, H. L. W. Chan, C. L. Choy, Z. T. Song, and S. L. Feng, Appl. Phys. Lett. 0003-6951 10.1063/1.1846154 86, 013110 (2005).
13. V. Ho, L. W. Teo, W. K. Choi, W. K. Chim, M. S. Tay, D. A. Antoniadis, E. A. Fitzgerald, A. Y. Du, C. H. Tung, R. Liu, and A. T. S. Wee, Appl. Phys. Lett. 0003-6951 10.1063/1.1615840 83, 3558 (2003).
14. Q. Wan, C. L. Lin, W. L. Liu, and T. H. Wang, Appl. Phys. Lett. 0003-6951 10.1063/1.1588373 82, 4708 (2003).
15. H. G. Chew, W. K. Choi, Y. L. Foo, F. Zheng, W. K. Chim, Z. J. Voon, K. C. Seow, E. A. Fitzgerald, and D. M. Y. Lai, Nanotechnology 0957-4484 10.1088/0957-4484/17/8/028 17, 1964 (2006).
16. J. von Borany, R. Grötzschel, K. H. Heinig, A. Markwitz, W. Matz, B. Schmidt, and W. Skorupa, Appl. Phys. Lett. 0003-6951 10.1063/1.120294 71, 3215 (1997).
17. A. Markwitz, L. Rebohle, H. Hofmeister, and W. Skorupa, Nucl. Instrum. Methods Phys. Res. B 147, 361 (1999).
18. C. Bonafos, B. Garrido, M. Lopez, A. Perez-Rodriguez, J. R. Morante, Y. Kihn, G. B. Assayag, and A. Claverie, Appl. Phys. Lett. 0003-6951 10.1063/1.126835 76, 3962 (2000).
19. C. Bonafos, B. Colombeau, M. Carrada, A. Altibelli, and A. Claverie, Mater. Sci. Eng., B 88, 112 (2002).
20. W. K. Choi, V. Ho, V. Ng, Y. W. Ho, S. P. Ng, and W. K. Chim, Appl. Phys. Lett. 0003-6951 10.1063/1.1891290 86, 143114 (2005).
21. H. G. Chew, F. Zheng, W. K. Choi, W. K. Chim, Y. L. Foo, and E. A. Fitzgerald, Nanotechnology 0957-4484 10.1088/0957-4484/18/6/065302 18, 065302 (2007).
22. V. Ho, Ph.D. thesis, National University of Singapore (2005).
23. J. Robertson, Eur. Phys. J.: Appl. Phys. 28, 265 (2004).
24. D. J. Lacks, Phys. Rev. Lett. 0031-9007 10.1103/PhysRevLett.84.4629 84, 4629 (2000).