Multimodal impurity redistribution and nanocluster formation in Ge implanted silicon dioxide films

Applied Physics Letters

Volumn 71, Issue 22, 1997, Pages 3215-3217

  Von Borany, J ^a   Grotzschel R ^a   Heinig, K H ^a   Markwitz, A ^a   Matz, W ^a   Schmidt, B ^a   Skorupa, W ^a  

^a INSTITUTE OF ION BEAM PHYSICS AND MATERIALS RESEARCH   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0003682151     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.120294     Document Type: Article

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