Nanoscale resist morphologies of dense gratings using electron-beam lithography

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 25, Issue 3, 2007, Pages 745-753

  Mohammad, M A ^a   Dew, S K ^a   Westra, K ^a   Li, P ^b   Aktary, M ^b   Lauw, Y ^c   Kovalenko, A ^c   Stepanova, M ^c  

^a UNIVERSITY OF ALBERTA   (Canada)

^b Applied Nanotools Inc   (Canada)

^c NATIONAL RESEARCH COUNCIL CANADA   (Canada)

Author keywords

[No Author keywords available]

Indexed keywords

COMPUTER SIMULATION; ELECTRON BEAM LITHOGRAPHY; ELECTRONS; MORPHOLOGY; POLYMETHYL METHACRYLATES;

DENSE GRATINGS; NUMERICAL MODELING;

NANOTECHNOLOGY;

EID: 34249892791     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.2731330     Document Type: Article

References (31)

1. O. Dial, C. C. Cheng, and A. Scherer, J. Vac. Sci. Technol. B 16, 3887 (1998).
2. C. Vieu, et al., Appl. Surf. Sci. 164, 111 (2000).
3. W. Hu, K. Sarveswaran, M. Lieberman, and G. H. Bernstein, J. Vac. Sci. Technol. B 22, 1711 (2004).
4. D. F. Kyser and N. S. Viswanathan, J. Vac. Sci. Technol. 12, 1305 (1975).
5. N. Glezos and I. Raptis, IEEE Trans. Comput.-Aided Des. 15, 92 (1996).
6. L. E. Ocola, W. Y. Li, R. J. Kasica, M. I. Blakey, P. A. Orphanos, W. K. Waskiewicz, A. E. Novembre, and M. Sato, Microelectron. Eng. 53, 433 (2000).
7. J. Zhou and X. M. Yang, J. Vac. Sci. Technol. B 24, 1202 (2006).
8. E. A. Dobisz, S. L. Brandow, R. Bass, and J. Mitterender, J. Vac. Sci. Technol. B 18, 107 (2000).
9. I. Raptis, N. Glezos, E. Valamontes, E. Zervas, and P. Argitis, Vacuum 62, 263 (2001).
10. M. Aktary, M. Stepanova, and S. K. Dew, J. Vac. Sci. Technol. B 24, 768 (2006).
11. D. G. Hasko, S. Yasin, and A. Mumtaz, J. Vac. Sci. Technol. B 18, 3441 (2000).
12. S. Yasin, D. G. Hasko, M. N. Khalid, D. J. Weaver, and H. Ahmed, J. Vac. Sci. Technol. B 22, 574 (2004).
13. Q. Hang, D. A. Hill, and G. H. Bernstein, J. Vac. Sci. Technol. B 21, 91 (2003).
14. Y. Yamaguchi and H. Namatsu, J. Vac. Sci. Technol. B 22, 1037 (2004).
15. L. E. Ocola and A. Stein, J. Vac. Sci. Technol. B 24, 3061 (2006).
16. L. E. Ocola, D. Tennant, G. Timp, and A. Novembre, J. Vac. Sci. Technol. B 17, 3164 (1999).
17. E. A. Dobisz, S. L. Brandow, E. Snow, and R. Bass, J. Vac. Sci. Technol. B 15, 2318 (1997).
18. S. Yasin, M. N. Khalid, D. G. Hasko, and S. Sarfraz, Microelectron. Eng. 78-79, 484 (2005).
19. L. E. Okola, J. Vac. Sci. Technol. B 21, 156 (2003).
20. G. P. Patsis and E. Gogolides, J. Vac. Sci. Technol. B 23, 1371 (2005).
21. M. Aktary, K. L. Westra, M. R. Freeman, and Y. Tanaka, J. Vac. Sci. Technol. B 24, 267 (2006).
22. M. A. Mohammad, P. Li, M. Aktary, and S. K. Dew (unpublished).
23. M. Aktary, M. A. Mohammad, S. K. Dew, L. Livadaru, M. Stepanova, and A. Kovalenko, Poster presented at the Canada Nanoscience and Nanotechnology Forum, Edmonton, Canada, June 2006.
24. H. Tanaka, J. Phys.: Condens. Matter 12, R207 (2000).
25. X. Huang, G. H. Bernstein, G. Bazan, and D. A. Hill, J. Vac. Sci. Technol. A 11, 1739 (1993).
26. T. Tanaka, M. Morigami, and N. Atoda, Jpn. J. Appl. Phys., Part 1 32, 6059 (1993).
27. Y. Ma and F. Cerina, J. Vac. Sci. Technol. B 23, 1096 (2005).
28. R. C. Ruaan, H. L. Chou, H. A. Tsai, D. M. Wang, and J. Y. Lai, J. Membr. Sci. 190, 135 (2001).
29. B. A. Miller-Chou and J. L. Koenig, Prog. Polym. Sci. 28, 1223 (2003).
30. F. Abe, K. Horita, Y. Einaga, and H. Yamakawa, Macromolecules 27, 725 (1994).
31. L. W. Flanagin, V. K. Singh, and C. G. Willson, J. Vac. Sci. Technol. B 17, 1371 (1999).