Effect of a surface inhibition layer on line edge roughness

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 23, Issue 3, 2005, Pages 1096-1101

  Ma, Yuansheng ^a   Cerrina, Franco ^a  

^a University of Wisconsin Madison   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

CHEMICALLY AMPLIFIED RESIST (CAR); CRITICAL DIMENSION (CD) VARIATION; LER MEASUREMENTS; LINE EDGE ROUGHNESS (LER);

COMPUTER SOFTWARE; PERCOLATION (FLUIDS); PHOTORESISTS; SCANNING ELECTRON MICROSCOPY; SURFACE ROUGHNESS;

PHOTOLITHOGRAPHY;

EID: 31144431998     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.1926292     Document Type: Article

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