Monte Carlo simulation of process parameters in electron beam lithography for thick resist patterning

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 24, Issue 3, 2006, Pages 1202-1209

  Zhou, Jianyun ^a   Yang, Xiaomin ^a  

^a SEAGATE RESEARCH   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

POINT-SPREAD FUNCTION; PROCESS PARAMETERS; SECONDARY ELECTRON DISTRIBUTION;

ASPECT RATIO; COMPUTER SIMULATION; MONTE CARLO METHODS; SUBSTRATES;

ELECTRON BEAM LITHOGRAPHY;

EID: 33744800291     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.2192543     Document Type: Article

References (17)

1. A. Moniwa, H. Yamaguchi, and S. Okazaki, J. Vac. Sci. Technol. B 10, 2771 (1992).
2. R. Rau, J. H. McClellan, and T. J. Drabik, J. Vac. Sci. Technol. B 14, 2445 (1996).
3. M. Osawa, K. Takahashi, M. Sato, H. Arimoto, K. Ogino, H. Hoshino, and Y. Machida, J. Vac. Sci. Technol. B 19, 2483 (2001).
4. M. Gentili, L. Grella, A. Lucchesini, L. Luciani, L. Mastrogiacomo, and P. Musumeci, J. Vac. Sci. Technol. B 8, 1867 (1990).
5. M. Rooks, N. Belic, E. Kratschmer, and R. Viswanathan, J. Vac. Sci. Technol. B 23, 2769 (2005).
6. X.-M. Yang, A. Eckert, K. Mountfield, H. Gentile, C. Seiler, S. Brankovic, and E. Johns, J. Vac. Sci. Technol. B 21, 3017 (2003).
7. X.-M. Yang, J. Vac. Sci. Technol. B 23, 2624 (2005).
8. A. Eckert and K. Mountfield, J. Vac. Sci. Technol. B 22, 2936 (2004).
9. X.-M. Yang, H. Gentile, A. Eckert, and S. R. Brankovic, J. Vac. Sci. Technol. B 22, 3339 (2004).
10. M. J. Rooks, E. Kratschmer, and R. Viswanathan, J. Vac. Sci. Technol. B 20, 2937 (2002).
11. J. H. Tortai, J. Thiault, R. Tiron, L. Mollard, S. Haefele, S. Vychub, J. Lewellen, and P. Brooker, Proceedings of European Mask and Lithography Conference (EMLC), 2005 (unpublished).
12. T. Itani, S. Hashimoto, M. Yamana, N. Samoto, and K. Kasama, Microelectron. Eng. 41/42, 363 (1998).
13. J.-B. Kim, J.-H. Choi, Y.-G. Kwon, M.-H. Jung, and K.-H. Chang, Polymer 40, 1087 (1999).
14. J. Thackeray, T. H. Fedynyshyn, D. Kang, and M. M. Rajaratnam, J. Vac. Sci. Technol. B 14, 4267 (1996).
15. L. F. Thompson, C. G. Wilson, and M. J. Bowden, Introduction to Microlithography (United Book Press Inc., Baltimore, MD, 1994), pp. 85-109.
16. S. Rizvi, Handbook of Photomask Manufacturing Technology (Taylor & Francis, LondonBoca Raton, FL, 2005), pp. 60-95.
17. I. Raptis, N. Glezos, E. Valamontes, E. Zervas, and P. Argitis, Vacuum 62, 263 (2001).