Correlation of surface roughness with edge roughness in PMMA resist

Microelectronic Engineering

Volumn 78-79, Issue 1-4, 2005, Pages 484-489

  Yasin, Shazia ^a   Khalid, M N ^a,b   Hasko, D G ^a   Sarfraz, S ^a  

^a UNIVERSITY OF CAMBRIDGE   (United Kingdom)

^b UNIVERSITY OF CAMBRIDGE   (United Kingdom)

Author keywords

e beam lithography; Edge roughness; Phase separation; PMMA

Indexed keywords

ATOMIC FORCE MICROSCOPY; CORRELATION METHODS; ELECTRON BEAM LITHOGRAPHY; PHASE SEPARATION; RESISTORS; SCANNING ELECTRON MICROSCOPY; SURFACE ROUGHNESS;

EDGE ROUGHNESS; LINE EDGE ROUGHNESS (LER); PMMA; TOLERANCE BUDGET;

EDGE DETECTION;

EID: 14944370244     PISSN: 01679317     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.mee.2004.12.062     Document Type: Conference Paper

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