Nanocontact printing using a hydrogen silsesquioxane stamp with low E-beam dose

Journal of the Electrochemical Society

Volumn 154, Issue 7, 2007, Pages

  Dai, Ming Tse ^a   Lam, Kai Yuen ^b   Chen, Henry J H ^c   Huang, Fon Shan ^a  

^a NATIONAL TSING HUA UNIVERSITY   (Taiwan)

^b I SHOU UNIVERSITY   (Taiwan)

^c NATIONAL CHI NAN UNIVERSITY   (Taiwan)

Author keywords

[No Author keywords available]

Indexed keywords

NANOIMPRINT LITHOGRAPHY; SILICON COMPOUNDS;

AMINOSILANE; NANOPATTERNS; TETRAMETHYL AMMONIUM HYDROXIDE (TMAH) SOLUTION;

ELECTRIC LAMPS;

ELECTRIC LAMPS; LITHOGRAPHY; SILICON COMPOUNDS;

EID: 34249881325     PISSN: 00134651     EISSN: None     Source Type: Journal    
DOI: 10.1149/1.2737346     Document Type: Article

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