Direct patterning on low dielectric constant materials with electron beam lithography

2001 International Microprocesses and Nanotechnology Conference, MNC 2001

Volumn , Issue , 2001, Pages 168-169

  Chen, Ben Chang ^a   Lai, Yee Kai ^b   Ko, Fu Hsiang ^a   Chou, Cheng Tung ^b   Chen, Hsuen Li ^a  

^a NATIONAL NANO DEVICE LABORATORIES   (Taiwan)

^b NATIONAL CENTRAL UNIVERSITY   (Taiwan)

Author keywords

[No Author keywords available]

Indexed keywords

DIELECTRIC MATERIALS; ELECTRON BEAMS; LOW-K DIELECTRIC; NANOTECHNOLOGY;

DIRECT-PATTERNING; HYDROGEN SILSESQUIOXANE; LOW DIELECTRIC CONSTANT MATERIALS; LOW DIELECTRIC CONSTANTS; NEGATIVE TONES; RESIST COATINGS; RESIST PROCESS;

ELECTRON BEAM LITHOGRAPHY;

EID: 84960341259     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1109/IMNC.2001.984143     Document Type: Conference Paper

References (1)

1. Namatsu H. et. al. J. Vac. Sci. Technol. 69,B 16(1), 1998.