5-nm-order electron-beam lithography for nanodevice fabrication

Digest of Papers - Microprocesses and Nanotechnology 2003 - 2003 International Microprocesses and Nanotechnology Conference, MNC 2003

Volumn , Issue , 2003, Pages 162-163

  Yamazaki, K ^a   Namatsu, H ^a  

^a Kashino Diverse Brain Research Laboratory of NTT Communication Science Laboratories   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ELECTRON BEAMS; NANOSTRUCTURED MATERIALS; NANOTECHNOLOGY;

HSQ RESIST; NANO-DEVICE FABRICATION; SEM MICROGRAPHS;

ELECTRON BEAM LITHOGRAPHY;

EID: 84949226574     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1109/IMNC.2003.1268626     Document Type: Conference Paper

References (2)

1. K. Yamazaki and H. Namatsu, Jpn. J. Appl. Phys. 42, U91 (2003).
2. H. Namatsu etal., Microelectron. Eng. 41/42, 331 (1998), and J. Vac. Sci. Technol. B 16,69 (1998)