Nanoscale pattern transfer for templates, NEMs, and nano-optics

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 6462, Issue , 2007, Pages

  Olynick, Deirdre L ^a   Liddle, J Alexander ^a,b   Harteneck, Bruce D ^a   Cabrini, Stefano ^a   Rangelow, Ivo W ^a,c  

^a LAWRENCE BERKELEY NATIONAL LABORATORY   (United States)

^b NATIONAL INSTITUTE OF STANDARDS   (United States)

^c ILMENAU UNIVERSITY OF TECHNOLOGY   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

MASK INTERACTIONS; NANO OPTICS; SILICON ETCHING;

INTEGRATED OPTICS; MASKS; NEMS; PLASMA ETCHING; SEMICONDUCTING SILICON; SHRINKAGE;

NANOELECTRONICS;

EID: 34248673463     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.705033     Document Type: Conference Paper

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