Plasma science and technology: 50 Years of progress

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 21, Issue 5, 2003, Pages

  Cecchi, J L ^a   Cecchi, L M ^b  

^a MSC01 1070   (United States)

^b SANDIA NATIONAL LABORATORIES   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

COSTS; ETCHING; NANOSTRUCTURED MATERIALS; VACUUM TECHNOLOGY; COMPUTER SIMULATION; DEPOSITION; INTEGRATED CIRCUIT MANUFACTURE; SYNTHESIS (CHEMICAL);

PLASMA SCIENCE; MICROFABRICATION; PLASMA PROCESSES; PLASMA SCIENCE AND TECHNOLOGY;

PLASMA THEORY; PLASMAS;

EID: 0242593791     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.1601612     Document Type: Conference Paper

References (0)