Mechanism for anisotropic etching of photoresist-masked, polycrystalline silicon in HBr plasmas

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 14, Issue 1, 1996, Pages 85-90

  Cheng, C C ^a,b   Guinn, K V ^b   Donnelly, V M ^b  

^a Gasonics IPC   (United States)

^b LUCENT TECHNOLOGIES   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0002020707     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.588439     Document Type: Article

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