Processing dependent behavior of soft imprint lithography on the 1-10-nm scale

IEEE Transactions on Nanotechnology

Volumn 5, Issue 3, 2006, Pages 301-307

  Hua, Feng ^a,b   Gaur, Anshu ^c   Sun, Yugang ^c   Word, Michael ^c   Jin, Niu ^a,c,e   Adesida, Ilesanmi ^{a,c,e,f,g,h,i}   Shim, Moonsub ^c   Shim, Anne ^d   Rogers, John A ^c,e  

^a IEEE

^b Clarkson University   (United States)

^c United States of America   (United States)

^d CABOT CORPORATION   (United States)

^e UNIVERSITY OF ILLINOIS AT URBANA CHAMPAIGN   (United States)

^f Department of Engineering ^*  (Spain)

^g Center for Nanoscale Science and Technology

^h College of Engineering ^*

ⁱ NATIONAL ACADEMY OF ENGINEERING   (United States)

Author keywords

Imprint lithography; Next generation lithography; Poly(dimethylsiloxane) (PDMS); Polymer physics; Replica molding

Indexed keywords

IMPRINT LITHOGRAPHY; NEXT GENERATION LITHOGRAPHY; POLY(DIMETHYLSILOXANE) (PDMS); POLYMER PHYSICS; REPLICA MOLDING;

CARBON NANOTUBES; ELECTRON BEAMS; METAL MOLDING; OPTICAL RESOLVING POWER; ORGANIC POLYMERS; SILICON COMPOUNDS;

NANOTECHNOLOGY;

EID: 33646727831     PISSN: 1536125X     EISSN: None     Source Type: Journal    
DOI: 10.1109/TNANO.2006.874051     Document Type: Conference Paper

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