Etching of polysilicon in inductively coupled Cl2 and HBr discharges: I. Experimental characterization of polysilicon profiles

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 20, Issue 3, 2002, Pages 1055-1063

  Mahorowala, Arpan P ^a   Sawin, Herbert H ^a   Jones, Richard ^b   Labun, Andrew H ^b  

^a Massachusetts Institute of Technology Cambridge   (United States)

^b HEWLETT PACKARD COMPANY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

DEPOSITION; ELECTRODES; INDUCTIVELY COUPLED PLASMA; MASKS; PHOTORESISTS; PLASMA ETCHING;

OXIDE MASKS;

POLYSILICON;

EID: 0035998543     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.1481866     Document Type: Conference Paper

References (17)