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Volumn 47, Issue 4-5 SPEC. ISS., 2007, Pages 645-648
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Electrical and structural properties of hafnium silicate thin films
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Author keywords
[No Author keywords available]
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Indexed keywords
ENERGY GAP;
METALLORGANIC CHEMICAL VAPOR DEPOSITION;
OPTICAL CONSTANTS;
PERMITTIVITY;
SILICON COMPOUNDS;
SPECTROSCOPIC ELLIPSOMETRY;
CAPACITANCE-VOLTAGE TECHNIQUES;
VACUUM ULTRAVIOLET;
THIN FILMS;
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EID: 34247155755
PISSN: 00262714
EISSN: None
Source Type: Journal
DOI: 10.1016/j.microrel.2007.01.065 Document Type: Article |
Times cited : (20)
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References (22)
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