Process optimization and integration of HfO2 and HF-silicates

Materials Research Society Symposium Proceedings

Volumn 811, Issue , 2004, Pages 229-240

  Takeuchi, Hideki ^a   King, Tsu Jae ^a  

^a UNIVERSITY OF CALIFORNIA   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ATOMIC FORCE MICROSCOPY; CMOS INTEGRATED CIRCUITS; CURRENT DENSITY; DIFFUSION; ELLIPSOMETRY; HAFNIUM COMPOUNDS; LEAKAGE CURRENTS; MOSFET DEVICES; OPTIMIZATION; PERMITTIVITY; SILICA; SILICATES; SURFACE ROUGHNESS; ULTRATHIN FILMS;

GATE DIELECTRICS; PROCESS OPTIMIZATION; SPECTROSCOPIC ELLIPSOMETRY (SE); SURFACE CHARGE ANALYSIS (SCA);

DIELECTRIC FILMS;

EID: 12744276110     PISSN: 02729172     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1557/proc-811-d7.6     Document Type: Conference Paper

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