Stress-induced deceleration of electromigration-driven void motion in metallic thin films

Journal of Applied Physics

Volumn 101, Issue 6, 2007, Pages

  Rauf Gungor, M ^a   Maroudas, Dimitrios ^a  

^a University of Massachusetts   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ELECTROMIGRATION DRIVEN VOID MOTION; MECHANICAL STRESS; METALLIC THIN FILMS; MIGRATION SPEED;

COMPUTER SIMULATION; ELECTROMECHANICAL DEVICES; ELECTROMIGRATION; METALLIC FILMS; NUMERICAL METHODS;

THIN FILMS;

EID: 34047165272     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.2709616     Document Type: Article

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