A simulation of electromigration-induced transgranular slits

Journal of Applied Physics

Volumn 79, Issue 5, 1996, Pages 2394-2403

  Wang, Weiqing ^a   Suo, Z ^a   Hao, T H ^b  

^a University of California   (United States)

^b DONGHUA UNIVERSITY   (China)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0000362877     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.361166     Document Type: Article

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