Characteristics of low-temperature pulse-laser-deposited (Pb,Sr)TiO 3 films in metal/ferroelectric/silicon structure

Journal of Physics D: Applied Physics

Volumn 40, Issue 1, 2007, Pages 254-259

  Wang, Jyh Liang ^a   Lai, Yi Sheng ^b   Lee, Trent Gwo Yann ^a   Chiou, Bi Shiou ^a   Tsai, Chun Chien ^a   Tseng, Huai Yuan ^a   Jan, Chueh Kuei ^a   Cheng, Huang Chung ^a  

^a NATIONAL CHIAO TUNG UNIVERSITY   (Taiwan)

^b NATIONAL UNITED UNIVERSITY   (Taiwan)

Author keywords

[No Author keywords available]

Indexed keywords

CRYSTALLIZATION; FERROELECTRIC MATERIALS; HYSTERESIS; LEAKAGE CURRENTS; POLYSILICON; PULSED LASER DEPOSITION; VAPORIZATION;

CRYSTALLINITY; ELECTRODE INTERFACES; SEMICONDUCTOR APPLICATIONS; SILICON STRUCTURE;

TITANIUM OXIDES;

EID: 33947689201     PISSN: 00223727     EISSN: 13616463     Source Type: Journal    
DOI: 10.1088/0022-3727/40/1/023     Document Type: Conference Paper

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