Low temperature radio-frequency-sputtered (Ba, Sr)TiO3 films on Pt/TiN/Ti/Si substrates with various oxygen/argon mixing ratios

Journal of the Electrochemical Society

Volumn 150, Issue 2, 2003, Pages

  Shye, Der Chi ^a   Chiou, Bi Shiou ^a   Lai, Ming Jiunn ^a   Hwang, Chuan Chou ^a   Jiang, Cheng Chung ^b   Chen, Jyh Shin ^b   Cheng, Ming Hwu ^b   Cheng, Huang Chung ^b  

^a NATIONAL CHIAO TUNG UNIVERSITY   (Taiwan)

^b National Science Council   (Taiwan)

Author keywords

[No Author keywords available]

Indexed keywords

ARGON; CAPACITORS; MAGNETRON SPUTTERING; OXYGEN; PERMITTIVITY; SPUTTER DEPOSITION;

RADIO FREQUENCY MAGNETRON COSPUTTERING;

THIN FILMS;

EID: 0037329221     PISSN: 00134651     EISSN: None     Source Type: Journal    
DOI: 10.1149/1.1536179     Document Type: Article

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