Structural and electrical characteristics of Bi3.5Sm 0.5Ti3O12 thin films on Si (1 0 0)

Journal of Crystal Growth

Volumn 264, Issue 1-3, 2004, Pages 351-356

  Liu, W L ^a   Xia, H R ^a   Han, H ^a   Wang, X Q ^a  

^a SHANDONG UNIVERSITY   (China)

Author keywords

A1. Crystal structure; A3. Metalorganic decomposition; B1. Bismuth titanate; B2. Ferroelectric materials

Indexed keywords

ANNEALING; BISMUTH COMPOUNDS; CAPACITANCE; CRYSTAL STRUCTURE; ELECTRIC CHARGE; ELECTRIC POTENTIAL; FERROELECTRIC MATERIALS; HYSTERESIS; METALLORGANIC CHEMICAL VAPOR DEPOSITION; SILICON; THIN FILMS; X RAY DIFFRACTION ANALYSIS;

BISMUTH TITANATE; METALORGANIC DECOMPOSITION;

CRYSTAL GROWTH;

EID: 1342264108     PISSN: 00220248     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.jcrysgro.2004.01.021     Document Type: Article

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