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Journal of Applied Physics

Volumn 101, Issue 5, 2007, Pages

Surface nucleation of the (111) plane of excimer laser annealed Si on SiO2 substrates: A molecular dynamics study

(4) Lee, Byoung Min a,b Kuranaga, Takahide c Munetoh, Shinji c Motooka, Teruaki c

a Korea Atomic Energy Research Institute (South Korea)

b Korea University of Technology and Education (South Korea)

c KYUSHU UNIVERSITY (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ANNEALING; EXCIMER LASERS; HEAT TRANSFER; MOLECULAR DYNAMICS; NUCLEATION; SILICA;

ATOMIC MOVEMENTS; LANGEVIN EQUATIONS; NEWTON EQUATIONS;

SEMICONDUCTING SILICON;

EID: 33947389728 PISSN: 00218979 EISSN: None Source Type: Journal
DOI: 10.1063/1.2646109 Document Type: Article

Times cited : (14)

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