Excimer laser-induced temperature field in melting and resolidification of silicon thin films

Journal of Applied Physics

Volumn 87, Issue 1, 2000, Pages 36-43

  Hatano, Mutsuko ^a,b   Moon, Seungjae ^a   Lee, Minghong ^a   Suzuki, Kenkichi ^b   Grigoropoulos, Costas P ^a  

^a UNIVERSITY OF CALIFORNIA   (United States)

^b HITACHI LTD   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0002444234     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.371823     Document Type: Article

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