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Volumn 63, Issue 23, 2001, Pages

Comment on “Molecular-dynamics simulations of solid-phase epitaxy of Si: Growth mechanisms”

Author keywords

[No Author keywords available]

Indexed keywords

SILICON;

EID: 0034905830     PISSN: 10980121     EISSN: 1550235X     Source Type: Journal    
DOI: 10.1103/PhysRevB.63.237401     Document Type: Article
Times cited : (7)

References (17)
  • 14
    • 0001097625 scopus 로고    scopus 로고
    • Based on the scaling between actual and simulated temperatures proposed by, and, 1650 K in the Tersoff potential corresponds to (formula presented) K in real temperature. [Note that they assumed that the melting point of Tersoff, -Si is 3000 K, slightly higher than the one estimated by Cook and Clancy (formula presented) K) Ref
    • Based on the scaling between actual and simulated temperatures proposed by K. Beardmore and N. Gronbech-Jensen, [Phys. Rev. B60, 12 610 (1999)], 1650 K in the Tersoff potential corresponds to (formula presented) K in real temperature. [Note that they assumed that the melting point of Tersoff c-Si is 3000 K, slightly higher than the one estimated by Cook and Clancy (formula presented) K) Ref.10).]
    • (1999) Phys. Rev. B , vol.60 , pp. 12 610
    • Beardmore, K.1    Gronbech-Jensen, N.2


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.