Molecular dynamics study of velocity distribution and local temperature change during rapid cooling processes in excimer-laser annealed silicon

Computational Materials Science

Volumn 37, Issue 3, 2006, Pages 198-202

  Lee, Byoung Min ^a,b   Munetoh, Shinji ^c   Motooka, Teruaki ^c  

^a Korea Atomic Energy Research Institute   (South Korea)

^b Yonsei University   (South Korea)

^c KYUSHU UNIVERSITY   (Japan)

Author keywords

MD simulations; Silicon; Velocity distribution

Indexed keywords

ANNEALING; COMPUTER SIMULATION; COOLING; MOLECULAR DYNAMICS; SILICON; TEMPERATURE CONTROL;

RAPID COOLING PROCESSES; TERSOFF POTENTIAL; VELOCITY DISTRIBUTION;

EXCIMER LASERS;

EID: 33746017231     PISSN: 09270256     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.commatsci.2006.01.017     Document Type: Article

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