Energy density window for location controlled Si grains by dual-beam excimer laser

Thin Solid Films

Volumn 419, Issue 1-2, 2002, Pages 199-206

  Burtsev, A ^a   Ishihara, R ^a   Beenakker, C I M ^a  

^a DELFT UNIVERSITY OF TECHNOLOGY   (Netherlands)

Author keywords

Excimer laser; Location control; Processing window; Single crystal silicon

Indexed keywords

COMPUTER SIMULATION; EXCIMER LASERS; GRAIN SIZE AND SHAPE; LASER BEAM EFFECTS;

ENERGY DENSITIES;

SILICON;

EID: 0036850957     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0040-6090(02)00775-7     Document Type: Article

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