The effect of adsorbed cationic surfactant on the pattern collapse of photoresist lines in photolithographic processes

Progress in Colloid and Polymer Science

Volumn 132, Issue , 2006, Pages 82-94

  Drechsler, A ^a   Petong, N ^a   Bellmann, C ^a   Busch, P ^a   Stamm, M ^a   Grundke, K ^a   Wunnicke, O ^b   Reichelt, J ^a,b  

^a LEIBNIZ INSTITUTE OF POLYMER RESEARCH DRESDEN   (Germany)

^b INFINEON TECHNOLOGIES AG   (Germany)

Author keywords

Adsorption; Capillary forces; Cationic surfactant; Hydrophobizing; Pattern collapse

Indexed keywords

EID: 33947211769     PISSN: 0340255X     EISSN: None     Source Type: Book Series    
DOI: 10.1007/2882_029     Document Type: Article

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