Surface properties and topography of 193 nm resist after exposure and development

Proceedings of SPIE-The International Society for Optical Engineering

Volumn 4690 I, Issue , 2002, Pages 332-341

  Wunnicke, Odo ^a   Hennig, Anja ^a,b   Grundke, Karina ^b   Stamm, Manfred ^b   Czech, Guenther ^a  

^a INFINEON TECHNOLOGIES AG   (Germany)

^b LEIBNIZ INSTITUTE OF POLYMER RESEARCH DRESDEN   (Germany)

Author keywords

Contact angle; Pattern collapse; Scanning force microscopy; Surface characterization

Indexed keywords

CONTACT ANGLE; HYDROPHILICITY; HYDROPHOBICITY; SEMICONDUCTOR DEVICE MANUFACTURE; SURFACE ROUGHNESS; THICKNESS MEASUREMENT; THIN FILMS;

LINE EDGE ROUGHNESS (LER); PATTERN COLLAPSE (PC);

PHOTORESISTS;

EID: 0036028765     PISSN: 0277786X     EISSN: None     Source Type: Journal    
DOI: 10.1117/12.474231     Document Type: Article

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