Improvement of pattern collapse in sub-100nm nodes

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 5039 II, Issue , 2003, Pages 1298-1303

  Jung, Myoung Ho ^a   Lee, Sung Ho ^a   Kim, Hyun Woo ^a   Woo, Sang Gyun ^a   Cho, Han Ku ^a   Han, Woo Sung ^a  

^a SAMSUNG Electronics   (South Korea)

Author keywords

ArF resist; Pattern collapse; Surfactant

Indexed keywords

LITHOGRAPHY; NANOTECHNOLOGY; PATTERN RECOGNITION; SURFACE ACTIVE AGENTS; SURFACE TENSION;

ARGON FLUORIDE RESIST; CRITICAL DIMENSION; PATTERN COLLAPSE;

PHOTORESISTS;

EID: 0141499167     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.485115     Document Type: Conference Paper

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